等离子刻蚀技术在第三代化合物半导体领域的应用Application of Plasma Etching Technology in the Third-generation Compound Semiconductor Field谢秋实北京北方华创微电子装备有限公司 第一刻蚀事业部副总经理XIE QiushiDeputy General Manager of NAURA Technology Group Co., Ltd.
高性能GaN-on-GaN材料与器件的外延生长High output power and bandwidth of c-plane GaN-on-GaN micro-LED for high-speed visible light communication王国斌江苏第三代半导体研究院研发部负责人WANG GuobinSenior Project ManagerHead of RD Dept of Jiangsu Institute of Advanced Semiconductors
第三代半导体碳化硅器件产业化关键技术及发展进展The key technology and development progress of the Wide Band-gap semiconductor silicon carbide device industrialization钮应喜芜湖启迪半导体有限公司研发总监NIU YingxiRD Director of Wuhu Advanced Semiconductor Manufacturing Co.,ltd
第三代半导体紫外探测技术与产业化应用Wide Bandgap Semiconductor Ultraviolet Detection Technology and Industrial Application陆 海--南京大学教授,镓敏光电董事长LU Hai--Professor of Nanjing University, President of GaNo Optoelectronics Inc.