无等离子体损伤GaN HEMT极化隔离的设计与优化Design and optimization of polarization isolation toward plasma-damage-free GaN HEMT戴贻钧中国科学院宁波材料技术与工程研究所DAI YiyunNingbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences

电热应力下碳化硅功率MOSFET损伤的多尺度探测表征方法Multi-scale Detection and Characterization of SiC Power MOSFET Damage under Electro-thermal Stress刘斯扬东南大学教授LIU SiyangProfessor of Southeast University