无等离子体损伤GaN HEMT极化隔离的设计与优化Design and optimization of polarization isolation toward plasma-damage-free GaN HEMT戴贻钧中国科学院宁波材料技术与工程研究所DAI YiyunNingbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences
SiC等离子体波脉冲功率器件与应用研究Research on 4H-SiC Plasma Wave Pulsed Power Devices and its Applications孙乐嘉西安电子科技大学副教授SUN LejiaAssociate Professor of Xidian University
等离子刻蚀技术在第三代化合物半导体领域的应用Application of Plasma Etching Technology in the Third-generation Compound Semiconductor Field谢秋实北京北方华创微电子装备有限公司 第一刻蚀事业部副总经理XIE QiushiDeputy General Manager of NAURA Technology Group Co., Ltd.
