SiC MOS器件氧化后退火新途径——低温再氧化退火技术A new approach of post-oxidation annealing for SiC MOS devices -- the low-temperature re-oxidation annealing technology
王德君——大连理工大学教授
Wang Dejun——Professor of Dalian University of Technology
SiC MOS器件氧化后退火新途径——低温再氧化退火技术A new approach of post-oxidation annealing for SiC MOS devices -- the low-temperature re-oxidation annealing technology
王德君——大连理工大学教授
Wang Dejun——Professor of Dalian University of Technology