视频简介： 下一代半导体器件外延制备前期的衬底清理技术 In-situ Wafer Cleaning for Pre-Epitaxial Deposition for Next Generation Semiconductor Devices Ismail I. KASHKOUSH 美国NAURA-Akrion, Inc.首席技术官 Ismail I. KASHKOUSHChief Technology Officer (CTO) of NAURA-Akrion, Inc., USA